Facilities of the Nanostructure and Magnetism laboratory
Elaboration and characterization tools

boulle.gif Cluster Source:


Method: sputtering and condensation in vapour phase
Clusters type: Co, Ni, Fe, Cu, NiCu, CoPt, FePt, Au, Si, Ge...
Dimension: 1-6 nm, dispersion: +/- 0.5 nm
Time of flight spectrometer, thickness deposition monitoring
Density: from 1 cluster/µm² to 100 nm thickness

Associated apparatus:
Load lock chamber, dimension < 25 mm
Oven for deposit and post growth baking : T < 700 °C
Two magnetrons (DC or RF) for other deposit and capping
Magnetic field available under deposition : 800 Gauss up to T = 500°C


boulle.gif Ultra high vacuum MBE chamber for metals / oxides




2 e-gun evaporators 2*4 crucibles
2 effusion cells

Materials: 3d transition metals: Co, Fe, Cr, etc
and non magnetic metals Pt, Pd, Al, etc...
MgO source MgO for tunnel barriers 

Rotating sample holder 1 inch
Electronic bombardment oven (~650°C)

Base pressure ~ 10-10 Torr

In situ characterizations: RHEED, STM-UHV, Auger/XPS, ionic/etching, irradiation He 10-30KV


boulle.gif Sputtering chamber


4 magnetrons, 3 DC sources and 1 RF source
Base pressure 2 10-8 mbar
10 sample holders (up to 3 inch)
Materials Co, Cu, NiFe, CoCr, Nb, Pt, Ti, Au


Characterization tools :


1.5-300 K with 600 K option, 7 T max
4.5-300 K, 0-1.2 T, 1T/s

Kerr magnetometry
In plane, 0.45 T max
In and out of plane, 1.4 T max

SQUID and VSM magnetometry

AFM/MFM : Multimode et Dimension



Other facilities available on site :


Transmission electronic microscopy 300, 400 kV: JEOL, FEI (at LEMMA)

Diffraction and reflexion of X-Rays (at SGX)

Electronic lithography: Jeol 6000FS nanowriter, SEM with beam blanker, UV and DUV; metallic and insolating deposition, RIE (at PTA)

Synchrotron radiation (at l’ESRF)


Last update : 10/17 2013 (444)


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